1st Step
Gas enters the deposition chamber and adsorbs or diffuses on the substrate surface.
2nd Step
Supply of activation energy through heat, pressure, plasma, etc.
3rd Step
Thin film deposition after gas decomposition by activation energy
Chemical vapor deposition(CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
CAT Beam Tech has been designing and producing various kinds of CVD chamber for manufacturing high-quality carbon nanotubes.
We design and develop customized CVD systems according to the needs of customers and provide equipment manufacturing solutions to customers.
